IP Library Granted Patent US 6,909,103
Granted Patent B2
US 6,909,103 · App. 10/886,463 · Granted Jun 21, 2005

Ion irradiation of a target at very high and very low kinetic ion energies

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Quick Facts
Patent No.
US 6,909,103
App. No.
10/886,463
Granted
Jun 21, 2005
Kind
B2
Abstract

A particle-beam exposure apparatus ( 1 ) for irradiating a target ( 41 ) by means of a beam ( 2 ) of energetic electrically charged particles comprises: an illumination system ( 101 ) for generating and forming said particles into a directed beam ( 21 ); a pattern definition means ( 102 ) located after the illumination system for positioning a pattern of apertures transparent to the particles in the path of the directed beam, thus forming a patterned beam ( 22 ) emerging from the pattern definition means through the apertures; and a projection system ( 103 ) positioned after the pattern definition means ( 102 ) for projecting the patterned beam ( 22 ) onto a target (41) positioned after the projection system. The apparatus further comprises an acceleration/deceleration means ( 32 ) containing an electric potential gradient which is oriented substantially parallel to the path of the structured beam and constant over at least a cross-section of the beam.

Claims (14)

1. A particle-beam exposure apparatus ( 1 , 4 , 7 , 8 ) for irradiating a target ( 41 ) by means of a beam ( 2 ) of energetic electrically charged particles, comprising

an illumination system ( 101 ) for generating and forming said energetic particles into a directed beam ( 21 ),

a pattern definition means ( 102 ) located after the illumination system as seen along the direction of the beam, said pattern definition means being adapted to position a pattern composed of apertures transparent to the energetic particles in the path of the directed beam, thus forming a patterned beam ( 22 ) emerging from the pattern definition means through the apertures, and

a projection system ( 103 ) positioned after the pattern definition means ( 102 ) and adapted to project the patterned beam ( 22 ) onto a target ( 41 ) positioned after the projection system, the apparatus further comprising at least one acceleration/deceleration means ( 32 , 14 , 17 , 18 ) containing an electric potential gradient oriented substantially parallel to the path of the beam, wherein the electric potential gradient is constant over at least a cross-section of the beam permeating the acceleration/deceleration means.

2. The apparatus of claim 1 , having an acceleration/deceleration means ( 32 , 18 ) realized as a component of the projection system ( 103 ).

3. The apparatus of claim 2 , wherein the projection system comprises a demagnifying projector ( 31 ) which is positioned in front of the acceleration/deceleration means, as seen along the direction of the beam.

4. The apparatus of claim 3 , wherein the acceleration/deceleration means is an electrostatic gradient tube ( 32 ) for acceleration/deceleration of the electrically charged particles by an energy difference corresponding to more than 50 kV potential difference.

5. The apparatus of claim 3 , wherein the acceleration/deceleration means is an electrostatic gradient tube ( 32 ) for acceleration/deceleration of the electrically charged particles by an energy difference corresponding to more than 100 kV potential difference.

6. The apparatus of claim 2 , wherein the projection system comprises a demagnifying projector ( 31 ′) which is positioned after the acceleration/deceleration means, as seen along the direction of the beam.

7. The apparatus of claim 6 , wherein the acceleration/deceleration means is an electrostatic gradient tube ( 17 , 18 ) for deceleration to energies below n·20 eV, where n is the charge number of the electrically charged particles.

8. The apparatus of claim 1 , having an acceleration/deceleration means ( 14 , 17 ) being positioned immediately in front of the pattern definition means ( 102 ), as seen along the direction of the beam.

9. The apparatus of claim 1 , wherein the electric potential gradient is substantially constant along at least a part of the length of the acceleration/deceleration means ( 32 ).

10. The apparatus of claim 1 , wherein the electrically charged particles are multiply charged.

11. The apparatus of claim 1 , wherein the electrically charged particles are heavy ions, Z≧2, preferably, Z≧18.

Assignments (5)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 13, 2024
From: IMS NANOFABRICATION GMBH
To: IMS NANOFABRICATION GMBH
Reel/Frame 067724/0838 →
CHANGE OF NAME Recorded Jan 29, 2018
From: IMS NANOFABRICATION AG
To: IMS NANOFABRICATION GMBH
Reel/Frame 045185/0484 →
LICENSE Recorded Mar 10, 2010
From: IMS NANOFABRICATION AG
To: INTEL CORPORATION
Reel/Frame 024055/0092 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 1, 2007
From: IMS-IONEN MIKROFABRIKATIONS SYSTEME GMBH
To: IMS NANOFABRICATION AG
Reel/Frame 019899/0339 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 7, 2004
From: PLATZGUMMER, ELMAR; STENGEL, GERHARD; LOESCHNER, HANS
To: IMS-IONEN MIKROFABRIKATIONS SYSTEME GMBH
Reel/Frame 015558/0348 →