Patent Assignment
Reel/Frame 046070/0085
Change of Name
Recorded: 2017-12-21
Pages: 81
Assignor
IMS NANOFABRICATION AG
Executed: 2017-07-27
Assignee
IMS NANOFABRICATION GMBH
SCHREYGASSE 3, VIENNA, 1020, AUSTRIA
Covered Properties
(33)
Pattern Lock System for Particle-Beam Exposure Apparatus
Charged-Particle Exposure Apparatus with Electrostatic Zone Plate
Charged-Particle Exposure Apparatus
Particle-Beam Apparatus with Improved Wien-Type Filter
Charged-Particle Exposure Apparatus
Multi-Beam Deflector Array Device for Maskless Particle-Beam Processing
Method for Maskless Particle-Beam Exposure
Pattern Definition Device Having Distinct Counter-Electrode Array Plate
Multi-Beam Source
Particle-Beam Exposure Apparatus with Overall-Modulation of a Patterned Beam
Compensation of Dose Inhomogeneity and Image Distortion
Constant Current Multi-Beam Patterning
Method for Maskless Particle-Beam Exposure
Method for Producing a Multi-Beam Deflector Array Device Having Electrodes
Global Point Spreading Function in Multi-Beam Patterning
Method for Maskless Particle-Beam Exposure
Multi-Beam Deflector Array Means with Bonded Electrodes
Pattern Definition Device with Multiple Multibeam Array
Method for Multi-Beam Exposure on a Target
High-Voltage Insulation Device for Charged-Particle Optical Apparatus
Pattern Definition Device Having Multiple Blanking Arrays
Method for Charged-Particle Multi-Beam Exposure
Compensation of Defective Beamlets in a Charged-Particle Multi-Beam Exposure Tool
Multi-Beam Tool for Cutting Patterns
Multi-Beam Tool for Cutting Patterns
Application:
14/694,975 →
Publication:
US 2015/0311031
Compensation of Dose Inhomogeneity Using Overlapping Exposure Spots
Compensation of Imaging Deviations in a Particle-Beam Writer Using a Convolution Kernel
Customizing a Particle-Beam Writer Using a Convolution Kernel
Correction of Short-Range Dislocations in a Multi-Beam Writer
Multi-Beam Writing of Pattern Areas of Relaxed Critical Dimension
Bi-Directional Double-Pass Multi-Beam Writing
Multi-Beam Writing Using Inclined Exposure Stripes
Method for Compensating Pattern Placement Errors Caused by Variation of Pattern Exposure Density in a Multi-Beam Writer
Related Assignments
(20)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Aug 13, 2007
From: PLATZGUMMER, ELMAR; CEMUSCA, STEFAN
To: IMS NANOFABRICATION AG
Reel/Frame 019687/0936 →
Assignment of Assignor's Interest
Aug 21, 2007
From: PLATZGAMMER, ELMAR; CERNUSCA, STEFAN; STENGL, GERHARG
To: IMS NANOFABRICATION AG
Reel/Frame 019722/0796 →
Assignment of Assignor's Interest
Oct 30, 2007
From: PLATZGUMMER, ELMAR
To: IMS NANOFABRICATION AG
Reel/Frame 020089/0085 →
Assignment of Assignor's Interest
Mar 10, 2008
From: PLATZGUMMER, ELMAR
To: IMS NANOFABRICATION AG
Reel/Frame 020621/0110 →
Assignment of Assignor's Interest
Apr 28, 2008
From: PLATZGUMMER, ELMAR; LOSCHNER, HANS; KVASNICA, SAMUEL; SPRINGER, REINHARD
To: IMS NANOFABRICATION AG; INSTITUT FUR MIKROELEKTRONIK
Reel/Frame 020865/0052 →
Assignment of Assignor's Interest
May 9, 2008
From: FRAGNER, HEINRICH; PLATZGUMMER, ELMAR
To: IMS NANOFABRICATION AG
Reel/Frame 020923/0737 →
Assignment of Assignor's Interest
Jul 24, 2008
From: PLATZGUMMER, ELMAR
To: IMS NANOFABRICATION AG
Reel/Frame 021288/0377 →
Assignment of Assignor's Interest
Jul 24, 2008
From: PLATZGUMMER, ELMAR
To: IMS NANOFABRICATION AG
Reel/Frame 021284/0975 →
Corrective Assignment to Correct the Second Inventor's Surname. It Should Read Stefan Cernusca Previously Recorded on Reel 019687 Frame 0936. Assignor(S) Hereby Confirms the Assignee.
Jul 31, 2008
From: PLATZGUMMER, ELMAR; CERNUSCA, STEFAN
To: IMS NANOFABRICATION AG
Reel/Frame 021321/0678 →
Assignment of Assignor's Interest
Sep 24, 2008
From: PLATZGUMMER, ELMAR
To: IMS NANOFABRICATION AG
Reel/Frame 021578/0681 →
Assignment of Assignor's Interest
Nov 26, 2008
From: STENGL, GERHARD; BUSCHBECK, HERBERT; NOWAK, ROBERT
To: IMS NANOFABRICATION AG
Reel/Frame 021894/0107 →
Assignment of Assignor's Interest
Oct 28, 2009
From: PLATZGUMMER, ELMAR; FRAGNER, HEINRICH; CERNUSCA, STEFAN
To: IMS NANOFABRICATION AG
Reel/Frame 023434/0188 →
Assignment of Assignor's Interest
Jan 13, 2010
From: FRAGNER, HEINRICH; PLATZGUMMER, ELMAR; BURLI, ADRIAN
To: IMS NANOFABRICATION AG
Reel/Frame 023772/0206 →
Assignment of Assignor's Interest
Feb 4, 2010
From: FRANGER, HEINRICH; PLATZGUMMER, ELMAR; NOWAK, ROBERT; BURLI, ADRIAN
To: IMS NANOFABRICATION AG
Reel/Frame 023901/0576 →
Assignment of Assignor's Interest
Feb 25, 2010
From: PLATZGUMMER, ELMAR; FRAGNER, HEINRICH
To: IMS NANOFABRICATION AG
Reel/Frame 023992/0664 →
License
Mar 10, 2010
From: IMS NANOFABRICATION AG
To: INTEL CORPORATION
Reel/Frame 024055/0092 →
Assignment of Assignor's Interest
Mar 25, 2010
From: PLATZGUMMER, ELMAR; FRAGNER, HEINRICH; CERNUSCA, STEFAN
To: IMS NANOFABRICATION AG
Reel/Frame 024133/0964 →
Assignment of Assignor's Interest
Jun 21, 2010
From: PLATZGUMMER, ELMAR
To: IMS NANOFABRICATION AG
Reel/Frame 024564/0284 →
Assignment of Assignor's Interest
Jul 23, 2010
From: PLATZGUMMER, ELMAR
To: IMS NANOFABRICATION AG
Reel/Frame 024735/0365 →
Assignment of Assignor's Interest
Jun 13, 2024
From: IMS NANOFABRICATION GMBH
To: IMS NANOFABRICATION GMBH
Reel/Frame 067724/0838 →