Patent Assignment
Reel/Frame 042776/0220
Change of Address
Recorded: 2017-06-13
Pages: 2
Assignor
HITACHI CHEMICAL COMPANY, LTD
Executed: 2013-01-01
Assignee
HITACHI CHEMICAL COMPANY, LTD.
9-2 MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 1006606, JAPAN
Covered Property
(1)
Positive-Type Photosensitive Resin Composition, Method for Production of Resist Pattern, Semiconductor Device, and Electronic Device
Related Assignments
(4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Jun 24, 2011
From: MATSUTANI, HIROSHI; UENO, TAKUMI; NICOLAS, ALEXANDRE; NANAUMI, KEN
To: HITACHI CHEMICAL COMPANY, LTD.
Reel/Frame 026492/0744 →
Change of Name
Mar 2, 2023
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 062917/0865 →
Change of Name
Mar 3, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062946/0125 →
Change of Address
Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →