IP Library Assignment 043599/0942
Patent Assignment
Reel/Frame 043599/0942

Assignment of Assignor's Interest

Recorded: 2017-09-15 Pages: 2
Assignors
NUNOMURA, NOBUHIDE
Executed: 2017-08-25
OGAWA, KEITAROU
Executed: 2017-08-25
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI-SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Discharge Chamber for a Plasma Processing Apparatus
Patent: 907,593 →
Application: 29/611,001 →
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Apr 14, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052398/0249 →