IP Library › Granted Patent US 907,593
Granted Patent S1
US 907,593 · App. 29/611,001 · Granted Jan 12, 2021

Discharge chamber for a plasma processing apparatus

Inventors: Nobuhide Nunomura (Tokyo, JP); Keitarou Ogawa (Tokyo, JP)
Assignee: Hitachi High-Tech Corporation
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Quick Facts
Patent No.
US 907,593
App. No.
29/611,001
Granted
Jan 12, 2021
Kind
S1
Claims (1)

The ornamental design for a discharge chamber for a plasma processing apparatus, as shown and described.

Assignments (2)
CHANGE OF NAME Recorded Apr 14, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052398/0249 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 15, 2017
From: NUNOMURA, NOBUHIDE; OGAWA, KEITAROU
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 043599/0942 →
Priority Claims (1)
JP 2017-000807 · Jan 20, 2017 · national