IP Library › Assignment 043693/0202
Patent Assignment
Reel/Frame 043693/0202

Assignment of Assignor's Interest

Recorded: 2017-09-26 Pages: 2
Assignors
ISHIMARU, RYO
Executed: 2017-07-10
UNE, SATOSHI
Executed: 2017-07-10
MORI, MASAHITO
Executed: 2017-07-10
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property (1)
Plasma Etching Method
Application: 15/701,692 →
Publication: US 2018/0122651
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →