Patent Assignment
Reel/Frame 043694/0974
Assignment of Assignor's Interest
Recorded: 2017-09-26
Pages: 2
Assignors
KOFUJI, NAOYUKI
Executed: 2017-07-11
MORI, MASAHITO
Executed: 2017-07-14
NISHIDA, TOSHIAKI
Executed: 2017-07-14
HAMASAKI, RYOJI
Executed: 2017-07-24
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property
(1)
Plasma Processing Device and Plasma Processing Method Using Same
Application:
15/558,005 →
Publication:
US 2018/0047595
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.