Patent Assignment
Reel/Frame 052225/0894
Change of Name
Recorded: 2020-03-25
Pages: 15
Assignor
HITACHI HIGH-TECHNOLOGIES CORPORATION
Executed: 2020-02-14
Assignee
HITACHI HIGH-TECH CORPORATION
17-1, TORANOMON 1-CHOME, MINATO -KU, TOKYO, JAPAN
Covered Properties
(133)
Mixed-Mode Adsorbent Material
Application:
13/139,727 →
Publication:
US 2011/0247981
Automatic Analyzer and Support System Therefor
Application:
13/141,882 →
Publication:
US 2011/0259129
Defect Review Support Device, Defect Review Device and Inspection Support Device
Application:
13/391,313 →
Publication:
US 2012/0233542
Inspection Apparatus and Inspection Method
Application:
13/391,323 →
Publication:
US 2012/0176493
Charged Particle Microscope
Application:
13/508,040 →
Publication:
US 2012/0217391
Electron Microscope, and Method for Adjustng Optical Axis of Electron Microscope
Application:
13/699,008 →
Publication:
US 2013/0062519
Automatic Analyzer
Application:
13/811,938 →
Publication:
US 2013/0121880
Automatic Analyzer
Application:
13/881,693 →
Publication:
US 2013/0259745
Automatic Analyzer
Application:
13/979,858 →
Publication:
US 2013/0302212
Plasma Processing Apparatus
Cell Series Structure for Analysis Device
Application:
14/236,906 →
Publication:
US 2014/0227135
Vacuum Processing Apparatus
Plasma Processing Apparatus and Plasma Processing Method
Plasma Processing Method
Application:
14/626,909 →
Publication:
US 2016/0079073
Plasma Processing Apparatus
Plasma Processing Apparatus
Vacuum Processing Apparatus
Application:
14/846,732 →
Publication:
US 2016/0217976
Cell Dispersion Device, and Automatic Subculture System Using Same
Application:
15/326,938 →
Publication:
US 2018/0080002
Defect Image Classification Device and Defect Image Classification Method
Application:
15/579,047 →
Publication:
US 2018/0174000
Plasma Processing Apparatus and Operational Method Thereof
Etching Method and Plasma Processing Apparatus
Defect Detection Device and Defect Observation Device
Vacuum Processing Apparatus
Plasma Processing Apparatus
Application:
15/718,948 →
Publication:
US 2018/0122665
Method for Measuring Overlay and Measuring Apparatus, Scanning Electron Microscope, and Gui
Charged Particle Beam Apparatus and Alignment Adjustment Method of Sample Stage
Plasma Processing Apparatus
Circuit Inspection Method and Sample Inspection Apparatus
Temperature Adjustment Apparatus
Inspection Device
Automated Analyzer
Automatic Analyzer
Plasma Processing Apparatus and Plasma Processing System
Plasma Processing Apparatus
Vacuum Processing Apparatus and Operating Method of Vacuum Processing Apparatus
Plasma Processing Apparatus and Prediction Method of the Condition of Plasma Processing Apparatus
Magnetic Tunnel Junction Device, Magnetoresistive Random Access Memory Using Same and Manufacturing Method of Magnetic Tunnel Junction Device
Semiconductor Manufacturing Apparatus and Method for Manufacturing Semiconductor Device
Application:
15/906,933 →
Publication:
US 2019/0131120
Plasma Processing Apparatus
Application:
15/906,983 →
Publication:
US 2019/0189396
Plasma Processing Apparatus and Plasma Processing Method
Charged Particle Device and Wiring Method
Plasma Processing Apparatus and Operation Method Thereof
Plasma Processing Apparatus and Plasma Processing Method
Measurement Device, Method and Display Device
Field Ionization Source, Ion Beam Apparatus, and Beam Irradiation Method
Defect Inspection Device, Pattern Chip, and Defect Inspection Method
Method for Manufacturing Magnetic Tunnel Junction Element, and Inductively Coupled Plasma Processing Apparatus
Plasma Processing Method
Specimen Observation Method
Charged Particle Beam Device with Distance Setting Between Irradiation Regions in a Scan Line
Electron Microscope
Inspection Information Generation Device, Inspection Information Generation Method, and Defect Inspection Device
Plasma Processing Apparatus
Application:
16/110,005 →
Publication:
US 2019/0287770
Wafer Processing Method and Wafer Processing Apparatus
Plasma Processing Apparatus
Vacuum Processing Apparatus
Plasma Processing Apparatus and Plasma Processing Method
Plasma Processing Method and Plasma Processing Device
Application:
16/111,853 →
Publication:
US 2018/0366335
Plasma Processing Apparatus
Application:
16/113,913 →
Publication:
US 2019/0214235
Charged Particle Beam Apparatus
Plasma Processing Apparatus and Plasma Processing Method
Plasma Processing Apparatus and Prediction Apparatus of the Condition of Plasma Processing Apparatus
Plasma Processing Apparatus
Plasma Processing Apparatus and Method for Venting a Processing Chamber to Atmosphere
Plasma Processing Apparatus and Plasma Processing Method
Plasma Processing Apparatus
Plasma Processing Apparatus
Inspection System, Image Processing Device and Inspection Method
Plasma Processing Apparatus, Plasma Processing Method and Plasma Processing Analysis Method
Search Device, Searching Method, and Plasma Processing Apparatus
Plasma Etching Method and Plasma Etching Apparatus
Plasma Processing Apparatus and Plasma Processing Method
Plasma Processing Apparatus
Magnetic Tunnel Junction Element, Magnetic Memory Using the Same, and Manufacture Method of Magnetic Tunnel Junction Element
Search Device, Search Method and Plasma Processing Apparatus
Plasma Processing Apparatus and Plasma Processing Method
Automatic Analyzer and Information Processing Apparatus
Plasma Processing Method and Plasma Processing Apparatus
Method for Treating Biomolecules and Method for Analyzing Biomolecules
Plasma Processing Method and Plasma Processing Apparatus
Application:
16/353,513 →
Publication:
US 2019/0287825
Plasma Processing Apparatus and Member of Plasma Processing Chamber
Application:
16/357,971 →
Publication:
US 2019/0326101
Operation Method of Vacuum Processing Device
Manufacturing Method of a Semiconductor Device and a Plasma Processing Apparatus
ION MILLING DEVICE, lON SOURCE, AND ION MILLING METHOD
Charged Particle Beam Control Device
Plasma Processing Apparatus
Wiring Guide Mechanism and Electronic Device
Column and Exchange Device
Application:
16/472,587 →
Publication:
US 2019/0317061
Aberration Corrector and Electron Microscope
Charged Particle Beam Device and Charged Particle Beam Device Noise Source Determination Method
Scanning Electron Microscope and Sample Observation Method Using Scanning Electron Microscope
Automated Analyzer and Liquid Discharge Method for Automated Analyzer
Plasma Processing Apparatus and Plasma Processing Method
Automated Analyzer
Measuring Apparatus and Method of Setting Observation Condition
Automated Analysis Device
Automatic Analysis Device and Automatic Analysis Method
Method of Manufacturing Magnetic Tunnel Junction and Magnetic Tunnel Junction
Charged Particle Beam Device
Defect Observation Device and Defect Observation Method
Plasma Processing Apparatus
Application:
16/494,437 →
Publication:
US 2021/0358722
Charged-Particle Beam System
Inspection Device
Substrate Processing Method and Plasma Processing Apparatus
Plasma Processing Device and Method for Processing Sample Using Same
Application:
16/495,369 →
Publication:
US 2021/0366791
Plasma Etching Method and Plasma Processing Apparatus
Dry Etching Apparatus and Dry Etching Method
Application:
16/495,652 →
Publication:
US 2021/0335625
Plasma Processing Method and Plasma Ashing Apparatus
State Prediction Apparatus and Semiconductor Manufacturing Apparatus
Plasma Processing Device
Application:
16/561,785 →
Publication:
US 2020/0083026
Plasma Processing Apparatus
Defect Observation System and Defect Observation Method for Semiconductor Wafer
Charged Particle Beam Apparatus
Charged Particle Beam System
Charged Particle Beam Device
Electron Beam Observation Device, Electron Beam Observation System, and Control Method of Electron Beam Observation Device
Chromatography Mass Spectrometry and Chromatograph Mass Spectrometer
Plasma Processing Apparatus, Plasma Processing Method, and Ecr Height Monitor
Semiconductor Manufacturing Apparatus and Method for Manufacturing Semiconductor Device
Flaw Inspection Device and Flaw Inspection Method
Plasma Processing Apparatus
Manufacturing Method for Semiconductor Device
Application:
62/954,101 →
Plasma Processing Apparatus
Plasma Processing Method
Plasma Processing Apparatus and Plasma Processing Method
Plasma Processing Apparatus and Analysis Method for Analyzing Plasma Processing Data
Biopolymer Analysis Device and Analysis System
Optical Measurement Device and Optical Measurement Method
Plasma Processing Device and Plasma Processing Method Using Same
Application:
15/558,005 →
Publication:
US 2018/0047595
Charged Particle Beam Device with Transient Signal Correction During Beam Blanking
Scanning Electron Microscope
Defect Observation Apparatus
Plasma Processing Apparatus
Patent:
10,600,617 →
Application:
16/569,161 →
Related Assignments
(22)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Jun 17, 2011
From: ONO, TETSUYOSHI; INOUE, YOSHINORI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 026476/0714 →
Assignment of Assignor's Interest
Jun 30, 2011
From: MURATA, SUMIKO; SHIBUYA, SATOSHI; NAKAMURA, KAZUHIRO
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 026529/0574 →
Assignment of Assignor's Interest
Feb 21, 2012
From: FUNAKOSHI, TOMOHIRO
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 027735/0342 →
Assignment of Assignor's Interest
Mar 12, 2012
From: HIROSE, NOBUAKI; HORAI, IZUO
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 027844/0102 →
Assignment of Assignor's Interest
May 9, 2012
From: SHICHI, HIROYASU; MATSUBARA, SHINICHI; ARAI, NORIAKI; ISHITANI, TOHRU
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 028178/0829 →
Assignment of Assignor's Interest
Nov 20, 2012
From: OYAGI, TOSHIYUKI; TOTSUJI, TAKAFUMI; NODERA, YASUYUKI; NAGAOKI, ISAO
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 029327/0748 →
Assignment of Assignor's Interest
Jan 29, 2013
From: YAMAZAKI, ISAO
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 029714/0097 →
Corrective Assignment to Correct the Third Inventor's Spelling of His Last Name Previously Recorded on Reel 029327 Frame 0748. Assignor(S) Hereby Confirms the Third Inventors Name Should Be Changed from "Takafumi Totsuji" to -- Takafumi Yotsuji--.
Feb 12, 2013
From: OYAGI, TOSHIYUKI; YOTSUJI, TAKAFUMI; NODERA, YASUYUKI; NAGAOKI, ISAO
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 029801/0383 →
Assignment of Assignor's Interest
Jun 14, 2013
From: YAMAZAKI, ISAO; MORI, TAKAMICHI; ISHIZAWA, HIROAKI; KUSANO, KAZUMI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 030615/0168 →
Assignment of Assignor's Interest
Jul 16, 2013
From: WAKUI, AKIHITO; YAMAZAKI, HAJIME
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 030805/0068 →
Assignment of Assignor's Interest
Feb 27, 2014
From: TETSUKA, TSUTOMU; SATAKE, MAKOTO; KAWAGUCHI, TADAYOSHI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 032318/0260 →
Assignment of Assignor's Interest
Mar 1, 2014
From: KONO, TSUTOMU; KAWAHARA, TETSUJI; KOMORI, NORIHISA
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 032330/0352 →
Assignment of Assignor's Interest
Aug 26, 2014
From: SATO, KOHEI; MAKINO, AKITAKA; TANAKA, KAZUUMI; SAKKA, YUSAKU
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 033612/0589 →
Assignment of Assignor's Interest
Mar 2, 2015
From: MATSUI, MIYAKO; YOKOGAWA, KENETSU; KANEKIYO, TADAMITSU; ONO, TETSUO
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 035069/0209 →
Assignment of Assignor's Interest
Mar 2, 2015
From: SONODA, YASUSHI; TANAKA, MOTOHIRO
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 035068/0877 →
Assignment of Assignor's Interest
Jul 16, 2015
From: ISHIGURO, MASAKI; SUMIYA, MASAHIRO; SHIRAYONE, SHIGERU; IKENAGA, KAZUYUKI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 036108/0780 →
Assignment of Assignor's Interest
Aug 31, 2015
From: IKENAGA, KAZUYUKI; ISHIGURO, MASAKI; SUMIYA, MASAHIRO; SHIRAYONE, SHIGERU
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 036456/0802 →
Assignment of Assignor's Interest
Sep 12, 2015
From: UEMURA, TAKASHI; TAUCHI, SUSUMU; SATO, KOHEI; MARUYAMA, EIJI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 036548/0137 →
Assignment of Assignor's Interest
Jan 19, 2017
From: SHIMASE, AKIHIRO; IMAI, KAZUMICHI; ASO, SADAMITSU; TAKADA, EIICHIRO
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 041020/0180 →
Assignment of Assignor's Interest
Sep 15, 2017
From: MATSUI, MIYAKO; KUWAHARA, KENICHI; YASUI, NAOKI; IZAWA, MASARU
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 043604/0706 →
Assignment of Assignor's Interest
Dec 12, 2017
From: TAKAGI, YUJI; HARADA, MINORU; HIRAI, TAKEHIRO
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 044365/0085 →
Assignment of Assignor's Interest
Mar 22, 2018
From: OTANI, YUKO; AOKI, KAZUO; HONDA, TOSHIFUMI; KANZAKI, NOBUHIKO
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 045320/0981 →