PLASMA PROCESSING APPARATUS
To reduce the damage caused due to the degradation of sealing material without complicating the structure of the vacuum sealing material of the vacuum container and to perform cleaning without affecting the lifetime of the sealing material in a plasma processing apparatus, this invention provides a plasma processing apparatus in which a window portion and a processing chamber are coupled to each other with an elastomeric sealing material sandwiched therebetween, and a sealing material is arranged at a position where a ratio of a distance from the inner wall surface of a processing chamber in an interstice portion to the sealing material with respect to the interstice between the window portion and the processing chamber having the sealing material sandwiched there between is 3 or more, in a vacuum state with the air exhausted from the processing chamber by the vacuum exhaust unit.
1 . A plasma processing apparatus comprising:
a processing chamber;
a vacuum exhaust unit which evacuates the processing chamber to vacuum;
a gas supply unit which supplies a gas into the processing chamber;
a sample table which mounts a target sample arranged within the processing chamber;
a window portion which is formed by dielectric material to form a ceiling surface of the processing chamber above the sample table; and
a microwave power supply unit which supplies microwave power into the processing chamber through the window portion,
wherein the window portion and the processing chamber are coupled to each other with an elastomeric sealing material sandwiched therebetween, and the sealing material is arranged at a position where the ratio of the distance from an inner wall surface of the processing chamber in an interstice portion to the sealing material, with respect to the interstice between the window portion and the processing chamber having the sealing material sandwiched there between, is 3 or more, in a vacuum state with the air exhausted from the processing chamber by the vacuum exhaust unit.
2 . The plasma processing apparatus according to claim 1 ,
wherein at the position where the ratio of the distance from the inner wall surface of the processing chamber in the interstice portion to the sealing material with respect to the interstice where to set the sealing material between the window portion and the processing chamber is 3 or more, a gas including nitrogen trifluoride (NF 3 ) is supplied from the gas supply unit into the processing chamber while exhausting the processing chamber by a vacuum exhaust unit to set an internal pressure of the processing chamber at 10 to 20 Pa, and microwave power is supplied from the microwave power supply unit into the processing chamber to generate plasma within the processing chamber, in which state a damage to the sealing material caused by radicals during the generated plasma which passes through the interstice between the window portion and the processing chamber and arrives at the sealing material is not a decisive factor of lifetime of the sealing material.
3 . The plasma processing apparatus according to claim 1 ,
wherein the elastomeric sealing material is formed of vinylidene fluoride-based fluorine-containing rubber.
4 . The plasma processing apparatus according to claim 1 ,
wherein the elastomeric sealing material is an O-ring.
5 . The plasma processing apparatus according to claim 4 ,
wherein the O-ring is embedded into a groove portion formed in the processing chamber, and the distance from the inner wall surface of the processing chamber in the interstice portion to the sealing material is a distance from the inner wall surface of the processing chamber to a portion bulging from the groove portion, of the O-ring embedded in the groove portion.
6 . A plasma processing apparatus comprising:
a processing chamber;
a vacuum evacuates the processing chamber into vacuum;
a gas supply unit which supplies a gas into the processing chamber;
a sample table which mounts a target sample arranged within the processing chamber;
a window portion which is formed by dielectric material to form a ceiling surface of the processing chamber above the sample table; and
a microwave power supply unit which supplies microwave power into the processing chamber through the window portion,
provided with a function of performing etching processing of etching the sample mounted on the sample table using plasma while supplying a first gas from the gas supply unit into the processing chamber and, in a state where the etched sample is taken out from the processing chamber, cleaning processing of generating plasma within the processing chamber while supplying a second gas from the gas supply unit into the processing chamber to eliminate products attached to the inside of the processing chamber through the etching processing,
wherein the window portion and the processing chamber are coupled to each other with an elastomeric sealing material sandwiched therebetween, and the sealing material is arranged at a position where a ratio of a distance from an inner wall surface of the processing chamber in an interstice portion to the sealing material with respect to the interstice between the window portion and the processing chamber having the sealing material sandwiched there between is 3 or more, in a vacuum state with the air exhausted from the processing chamber by the vacuum exhaust unit and where a damage to the sealing material caused by the plasma generated within the processing chamber in the cleaning processing is not a decisive factor of lifetime of the sealing material.
7 . The plasma processing apparatus according to claim 6 ,
wherein at the position where the ratio of the distance from the inner wall surface of the processing chamber in the interstice portion to the sealing material with respect to the interstice where to set the sealing material between the window portion and the processing chamber is 3 or more, a gas including nitrogen trifluoride (NF 3 ) is supplied from the gas supply unit into the processing chamber while vacuum-exhausting the air from the processing chamber by the vacuum exhaust unit to set an internal pressure of the processing chamber at 10 to 20 Pa, and microwave power is supplied from the microwave power supply unit into the processing chamber to generate plasma within the processing chamber, in which state a damage to the sealing material caused by radicals during the generated plasma which passes through the interstice between the window portion and the processing chamber and arrives at the sealing material is not a decisive factor of lifetime of the sealing material.
8 . The plasma processing apparatus according to claim 6 ,
wherein the elastomeric sealing material is formed of vinylidene fluoride-based fluorine-containing rubber.
9 . The plasma processing apparatus according to claim 6 ,
wherein the elastomeric sealing material is an O-ring.
10 . The plasma processing apparatus according to claim 9 ,
wherein the O-ring is embedded into a groove portion formed in the processing chamber, and the distance from the inner wall surface of the processing chamber in the interstice portion to the sealing material is a distance from the inner wall surface of the processing chamber to a portion bulging from the groove portion, of the O-ring embedded in the groove portion.