IP Library Granted Patent US 11,158,481
Granted Patent B2
US 11,158,481 · App. 16/381,938 · Granted Oct 26, 2021

Ion milling device, ion source, and ion milling method

Inventors: Kengo Asai (Tokyo, JP); Hiroyasu Shichi (Tokyo, JP); Hisayuki Takasu (Tokyo, JP); Toru Iwaya (Tokyo, JP)
Assignee: HITACHI HIGH-TECH CORPORATION
H01J37/08H01J27/04H01J37/30H01J37/305H01J37/3056H01J2237/081H01J2237/082H01J2237/303
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Quick Facts
Patent No.
US 11,158,481
App. No.
16/381,938
Granted
Oct 26, 2021
Kind
B2
Abstract

To provide an ion gun of a penning discharge type capable of achieving a milling rate which is remarkably higher than that in the related art, an ion milling device including the same, and an ion milling method. An ion generation unit includes a cathode that emits electrons, an anode that is provided within the ion generation unit and has an inner diameter of 5.2 mm or less, and magnetic-field generation means using a permanent magnet of which a maximum energy product ranges from 110 kJ/m 3 to 191 kJ/m 3 .

Claims (48)

1. An ion milling device comprising:

an ion source configured to cause electrons to collide with a gas supplied from an outside of the ion milling device and to generate ions; and

an acceleration electrode at which a voltage of 5 kV or more is applied as an electrode that accelerates the ions emitted from the ion source, and that irradiates a sample with the accelerated ions so as to process the sample,

wherein the ion source includes

a cathode from which the electrons are emitted;

an anode that is provided within the ion source and has an inner diameter of 5.2 mm or less; and

a magnetic-field generator that generates a magnetic field within the ion source by using a samarium-cobalt magnet.

2. The ion milling device according to claim 1 ,

wherein the samarium-cobalt magnet has a cylindrical shape.

3. The ion milling device according to claim 1 ,

wherein a voltage of 6 kV or more is applied to the acceleration electrode.

4. The ion milling device according to claim 1 ,

wherein the ion source is a penning type.

5. The ion milling device according to claim 1 ,

wherein a residual magnetic flux density remaining in a permanent magnet of the magnetic-field generator in an absence of a voltage being present at said anode of the ion source ranges from 810 mT to 950 mT.

6. The ion milling device according to claim 1 ,

wherein a holding force of the magnetic-field generator ranges from 620 mT to 660 mT.

7. The ion milling device according to claim 1 ,

wherein a shape of the anode is a cylindrical shape, and an inner diameter of the anode is the same as a diameter of an outlet hole of the anode.

8. The ion milling device according to claim 1 ,

wherein a diameter of an outlet hole of the anode is smaller than an inner diameter of the anode.

9. The ion milling device according to claim 8 ,

wherein the diameter of the outlet hole of the anode is 4 mm.

10. An ion source that is used in an ion milling device that includes the ion source which causes electrons to collide with a gas supplied from an outside of the ion milling device and that generates ions, and an acceleration electrode at which a voltage of 5 kV or more is applied as an electrode that accelerates the ions emitted from the ion source, and that irradiates a sample with the accelerated ions so as to process the sample, the ion source comprising:

a cathode from which the electrons are emitted;

an anode which is provided within the ion source, and has an inner diameter of 5.2 mm or less; and

a magnetic-field generator that generates a magnetic field within the ion source by using a samarium-cobalt magnet.

11. The ion source according to claim 10 ,

wherein the samarium-cobalt magnet has a cylindical shape.

12. The ion source according to claim 10 ,

wherein a voltage of 6 kV or more is applied to the acceleration electrode.

13. The ion source according to claim 10 ,

wherein the ion source is a penning type.

14. The ion source according to claim 10 ,

wherein a residual magnetic flux density of a permanent magnet of the magnetic-field generator in an absence of a voltage being present at said anode of the ion source ranges from 810 mT to 950 mT.

15. The ion source according to claim 10 ,

wherein a holding force of the magnetic-field generator ranges from 620 mT to 660 mT.

16. An ion milling device comprising:

an ion source configured to receive a supplied gas; and

an acceleration electrode at which a voltage of 5 kV or more is applied,

wherein the ion source includes

a cathode;

an anode having an inner diameter of 5.2 mm or less; and

a samarium-cobalt magnet having a cylindrical shape.

17. An ion source that is used in an ion milling device that includes the ion source configured to receive a supplied gas, and an acceleration electrode at which a voltage of 5 kV or more is applied, the ion source comprising:

a cathode;

an anode having an inner diameter of 5.2 mm or less; and

a samarium-cobalt magnet having a cylindrical shape.

Assignments (1)
CHANGE OF NAME Recorded Mar 25, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052225/0894 →
Priority Claims (1)
JP 2014-154424 · Jul 30, 2014 · national
Continuity (2)
Continuation 15500449
Related Publication 20190237291A1 · Aug 1, 2019