IP Library Patent Application 13508040
Patent Application
App. No. 13/508,040

CHARGED PARTICLE MICROSCOPE

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Quick Facts
Patent No.
US None
App. No.
13/508,040
Abstract

The charged particle beam microscope is configured of: a gas field ionization ion source ( 1 ); a focusing lens ( 5 ) which accelerates and focuses ions that have been discharged from the ion source; a movable first aperture ( 6 ) which limits the ion beam that has passed through the focusing lens; a first deflector ( 35 ) which scans or aligns the ion beam that has passed through the first aperture; a second deflector ( 7 ) which deflects the ion beam that has passed through the first aperture; a second aperture ( 36 ) which limits the ion beam that has passed through the first aperture; an objective lens ( 8 ) which focuses, on a sample, the ion beam that has passed through the first aperture; and a means for measuring the signal, which is substantially proportional to the current of the ion beam that has passed through the second aperture.

Claims (63)

1 . A charged particle microscope comprising:

a vacuum container;

an emitter tip arranged in the vacuum container;

an extraction electrode having an opening part through which ions generated by the emitter tip pass;

an ion source having the emitter tip and the extraction electrode;

a focusing lens focusing an ion beam discharged from the ion source; and

a first deflector deflecting the ion beam that has passed through the focusing lens,

wherein a first aperture restricting the ion beam that has passed through the focusing lens is provided between the focusing lens and the first deflector.

2 . The charged particle microscope according to claim 1 ,

wherein the first aperture is mobile within a plane substantially perpendicular to the ion beam.

3 . The charged particle microscope according to claim 1 , further comprising:

a second deflector deflecting the ion beam that has passed through the first aperture;

a second aperture restricting the ion beam that has passed through the first aperture;

an objective lens focusing onto a sample the ion beam that has passed through the first aperture; and

a signal volume measurement means adapted to measure a signal volume substantially proportional to ion beam current of the ion beam that has passed through the second aperture.

4 . The charged particle microscope according to claim 3 ,

wherein the second aperture restricts the ion beam that has passed through the objective lens.

5 . The charged particle microscope according to claim 3 ,

wherein the signal volume measurement means is a charged particle detector detecting secondary particles discharged from the sample as a result of irradiation of the ion beam.

6 . The charged particle microscope according to claim 5 ,

wherein a sample for adjustment is loaded.

7 . The charged particle microscope according to claim 3 ,

wherein the signal volume measurement means includes at least one of: an ammeter measuring the ion beam current; an ammeter connected to the sample; a means adapted to amplify the ion beam current with a channel thoron for measurement; and a means adapted to achieve amplification with a multi-channel plate for measurement.

8 . The charged particle microscope according to claim 3 ,

wherein the second aperture also serves as an electrode forming the objective lens.

9 . The charged particle microscope according to claim 1 ,

wherein a tip end of the emitter tip is a nano-pyramid.

10 . The charged particle microscope according to claim 9 , further comprising

a display means adapted to display an ion radiation pattern of the nano-pyramid.

11 . A charged particle microscope comprising:

a vacuum container;

an emitter tip arranged in the vacuum container;

an extraction electrode having an opening part through which ions generated by the emitter tip pass;

an ion source having the emitter tip and the extraction electrode; and

a focusing lens focusing an ion beam discharged from the ion source, the charged particle microscope further comprising:

a tilt angle adjustment means adapted to be capable of adjusting a tilt angle with respect to an irradiation axis of the ion beam; and

a display means adapted to display an ion radiation pattern depending on a difference in the tilt angle.

12 . The charged particle microscope according to claim 11 ,

wherein a driving mechanism forming the tilt angle adjustment means is arranged in the ion source, and tilting can be done while position of a tip end of an ion emitter having the emitter tip is kept substantially constant.

13 . The charged particle microscope according to claim 11 ,

wherein the driving mechanism driving the tilt angle adjustment means uses a piezo element.

14 . A charged particle microscope comprising:

a vacuum container;

an emitter tip arranged in the vacuum container;

an extraction electrode having an opening part through which ions generated by the emitter pass;

an ion source having the emitter and the extraction electrode;

a focusing lens focusing an ion beam discharged from the ion source; and

a first deflector deflecting the ion beam that has passed through the focusing lens, the charged particle microscope further comprising

a light detection means adapted to detect from the opening part light generated from the emitter tip or a filament connected to the emitter tip.

15 . The charged particle microscope according to claim 14 , further comprising

a change means adapted to change relative position between the emitter and the extraction electrode.

16 . The charged particle microscope according to claim 14 , further comprising

a control means adapted to control, based on a signal detected by the light detection means, at least one of voltage applied to the filament, current, resistance, and temperature.

17 . The charged particle microscope according to claim 14 , further comprising

a means adapted to permit the light detection means to observe the emitter or the filament connected to the emitter outside of the vacuum container through the opening part.

18 . The charged particle microscope according to claim 14 ,

wherein a sample stage loaded with the sample has a mobile function within a plane substantially perpendicular to the ion beam, and

the sample stage is provided with a means adapted to permit observation of the emitter or the filament connected to the emitter outside of the vacuum container through the opening part.

19 . The charged particle microscope according to claim 14 ,

wherein a means adapted to permit the observation of the emitter or the filament connected to the emitter outside of the vacuum container through the opening part is provided between the focusing lens and the objective lens.

20 . The charged particle microscope according to claim 14 ,

wherein a first aperture is provided between the focusing lens and the first deflector, and

at least part of the light detection means is included in the first aperture.

Assignments (2)
CHANGE OF NAME Recorded Mar 25, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052225/0894 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 9, 2012
From: SHICHI, HIROYASU; MATSUBARA, SHINICHI; ARAI, NORIAKI; ISHITANI, TOHRU; OSE, YOICHI; KAWANAMI, YOSHIMI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 028178/0829 →