Inspection device

1. An inspection device comprising:

an image analysis apparatus that analyzes a top-down image signal of a sample which is output from a charged particle beam apparatus and has a plurality of columnar patterns or hole-shaped patterns formed at a regular interval, wherein the image analysis apparatus is configured to perform an edge calculation for an outline of an image obtained from the top-down image signal as a set of discrete points representing a position of an edge,

wherein the image analysis apparatus is further configured to perform

an approximation calculation that approximates the set of discrete points of the edge using an ellipse or a circle,

a distance calculation that calculates a distance between the approximated ellipse or the circle and each point of the edge,

an angle calculation that calculates a major axis, a minor axis, an eccentricity, and an angle formed by a major axis direction with an image horizontal axis direction of the approximated ellipse as a first index group, and

a Cr calculation that calculates a circumferential length of an outline of a columnar pattern or hole-shaped pattern on the sample and a value obtained by dividing a square of the circumferential length by a value obtained by multiplying an area surrounded by the outline of the columnar pattern and 4π as one of a second index group.

2. The inspection device according to claim 1 ,

wherein the image analysis apparatus is further configured to perform an Sr calculation that calculates a first value obtained by dividing a second value, which is obtained by multiplying a standard deviation of a distribution of values of a distance between the set of the discrete points of the edge and the approximate ellipse or circle by 3, by an average radius of the approximate ellipse or a radius of the circle as another one of a second index group.

3. The inspection device according to claim 1 ,

wherein the image analysis apparatus is further configured to perform a frequency distribution calculation that calculates

a frequency distribution of index values of the first and second index groups calculated on an image of a plurality of patterns obtained from a plurality of locations on the sample, and

a statistical index calculation that calculates an average value of the index values, a standard deviation of the distribution, skewness, and kurtosis from the calculated frequency distribution as a statistical index group.

4. The inspection device according to claim 3 , further comprising:

a display that displays at least one of the statistical index groups.

5. The inspection device according to claim 3 , further comprising:

wherein the image analysis apparatus is further configured to output a warning issuing a warning in a case where a calculated index value in the statistical index group deviates from an upper limit value or a lower limit value input in advance for at least one of the statistical index groups or both range of the upper limit value and the lower limit value.

6. The inspection device according to claim 3 , further comprising:

a display that associates at least one index value among the first and second index groups with a position on the sample and in a case where it is determined that most abnormalities occur in the edge of the sample, and performs displaying so as to adjust conditions of an exposure apparatus.

7. An inspection device comprising:

a charged particle beam irradiation device that irradiates a sample with a charged particle beam;

a controller that controls the charged particle beam irradiation device;

an image analysis apparatus that analyzes an image obtained by using a secondary electron emitted from the sample by irradiation of the charged particle beam; and

a terminal that includes a display twit-connected to the controller and the image analysis apparatus,

wherein a plurality of columnar patterns or hole-shaped patterns are formed on a surface of the sample, and

wherein the image analysis apparatus is further configured to

select a first index among a diameter D and a radius R of an approximate circle for approximating a shape of one of the plurality of columnar patterns or hole-shaped patterns when subjected to a top-down observation by a circle, and a major axis a, a minor axis b, an angle θ formed by a major axis direction with an image horizontal axis direction, an eccentricity e, and an ellipticity f of an approximate ellipse for approximating a shape of said one columnar pattern or hole-shaped pattern with an ellipse, as the first index for analyzing said one columnar pattern or hole-shaped pattern, and

select a second index among Cr that is a first value obtained by dividing a square of a circumferential length of an outline of one of the plurality of columnar patterns or hole-shaped patterns obtained from the image by 4π and further dividing the first value by an area surrounded by the outline and Sr that is a second value obtained by dividing a third value, which is obtained by multiplying a standard deviation of a distribution of values of a distance between the approximate ellipse or the approximate circle and an edge of the outline by 3, by a radius of the approximate circle or an average radius of the approximate ellipse.

8. The inspection device according to claim 7 ,

wherein the image analysis apparatus is further configured to perform

a frequency distribution calculation that calculates a frequency distribution of index values of the selected first and second indexes and which is calculated on an image of a plurality of the columnar patterns or hole-shaped patterns obtained from a plurality of locations on the sample, and

a statistical index calculation that calculates at least one of an average value of the index values a standard deviation of the distribution, skewness, and kurtosis from the calculated frequency distribution as a statistical index.

9. An inspection device comprising:

a charged particle beam irradiation system that irradiates a sample with a charged particle beam;

a controller that controls the charged particle beam irradiation system;

an image analysis apparatus that analyzes an image obtained using a secondary electron emitted from the sample by irradiation of the charged particle beam; and

a terminal that includes a display connected to the controller and the image analysis apparatus,

wherein a plurality of columnar patterns or hole-shaped patterns are formed on a surface of the sample, and

wherein the display of the terminal provides a screen for selecting

a diameter D and a radius R of an approximate circle for approximating a shape of one of the plurality of columnar patterns or hole-shaped patterns when subjected to a top-down observation by a circle, and a major axis a, a minor axis b, an angle θ formed by a major axis direction with an image horizontal axis, an eccentricity e, and an ellipticity f of an direction approximate ellipse for approximating a shape of said one columnar pattern or hole-shaped pattern with an ellipse, as a first index for analyzing the one columnar pattern or hole-shaped pattern, and

Cr that is a first value obtained by dividing a square of a circumferential length of an outline of said one columnar pattern or hole-shaped pattern obtained from the image by 4π and further dividing the first value by an area surrounded by the outline and Sr that is a second value obtained by dividing a third value, which is obtained by multiplying a standard deviation of a distribution of values of a distance between the approximate ellipse or the approximate circle and an edge of the outline by 3, by a radius of the approximate circle or an average radius of the approximate ellipse, as a second index.

10. The inspection device according to claim 9 ,

wherein the display of the terminal displays at least one of a frequency distribution of a plurality of the first index and/or the second index corresponding to the plurality of columnar patterns or hole-shaped patterns, an average value of index values, a standard deviation of the distribution, skewness, and kurtosis.