IP Library Assignment 043792/0791
Patent Assignment
Reel/Frame 043792/0791

Assignment of Assignor's Interest

Recorded: 2017-10-05 Pages: 2
Assignors
TAMARI, NANAKO
Executed: 2017-08-02
TAMURA, HITOSHI
Executed: 2017-08-02
YASUI, NAOKI
Executed: 2017-08-02
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property (1)
The Plasma Processing Apparatus and Plasma Processing Method
Application: 15/562,353 →
Publication: US 2019/0006153
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →