IP Library Assignment 044360/0793
Patent Assignment
Reel/Frame 044360/0793

Assignment of Assignor's Interest

Recorded: 2017-12-12 Pages: 4
Assignors
TABATA, MASAHIRO
Executed: 2017-11-20
KUMAKURA, SHO
Executed: 2017-11-20
Assignee
TOKYO ELECTRON LIMITED
3-1, AKASAKA 5-CHOME, MINATO-KU, TOKYO, 107-6325, JAPAN
Covered Property (1)
Method of Selectively Etching First Region Made of Silicon Nitride Against Second Region Made of Silicon Oxide
Application: 15/837,195 →
Publication: US 2018/0166303