Patent Assignment
Reel/Frame 044949/0704
Assignment of Assignor's Interest
Recorded: 2017-12-22
Pages: 42
Assignors
MAUDER, ANTON
Executed: 2017-12-18
HELLMUND, OLIVER
Executed: 2017-12-18
IRSIGLER, PETER
Executed: 2017-12-19
KONRATH, JENS PETER
Executed: 2017-12-18
LAFORET, DAVID
Executed: 2017-12-18
LANGNER, MAIK
Executed: 2017-12-21
NEUBER, MARKUS
Executed: 2017-12-19
SCHULZE, HANS-JOACHIM
Executed: 2017-12-18
SIEMIENIEC, RALF
Executed: 2017-12-21
STAHRENBERG, KNUT
Executed: 2017-12-18
STORBECK, OLAF
Executed: 2017-12-18
Assignee
INFINEON TECHNOLOGIES AG
AM CAMPEON 1-12, NEUBIBERG, 85579, GERMANY
Covered Property
(1)
Forming Silicon Oxide Layers by Radical Oxidation and Semiconductor Device with Silicon Oxide Layer