Patent Assignment
Reel/Frame 045097/0140
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded: 2018-01-19
Received: 2018-01-19
Pages: 17
Assignor
AKRION SYSTEMS LLC
Executed: 2018-01-16
Assignee
NAURA AKRION INC.
6330 HEDGEWOOD DRIVE, SUITE 150, ALLENTOWN, PA, 18106, UNITED STATES
Covered Applications
(88)
METHOD FOR SELECTIVE UNDER-ETCHING OF POROUS SILICON
App. No. 15/240,451
→
METHOD OF PRIMING AND DRYING SUBSTRATES
App. No. 15/177,643
→
SYSTEM AND METHOD FOR THE SONIC-ASSISTED CLEANING OF SUBSTRATES UTILIZING A SONIC-TREATED LIQUID
App. No. 14/753,837
→
COMPOSITE TRANSDUCER APPARATUS AND SYSTEM FOR PROCESSING A SUBSTRATE AND METHOD OF CONSTRUCTING THE SAME
App. No. 14/727,116
→
CORRELATION BETWEEN CONDUCTIVITY AND PH MEASUREMENTS FOR KOH TEXTURING SOLUTIONS AND ADDITIVES
App. No. 14/703,459
→
METHOD FOR SELECTIVE UNDER-ETCHING OF POROUS SILICON
App. No. 14/667,157
→
METHOD FOR CONSISTENTLY TEXTURIZING SILICON WAFERS DURING SOLAR CELL WET CHEMICAL PROCESSING
App. No. 14/398,934
→
SYSTEM, APPARATUS, AND METHOD FOR PROCESSING SUBSTRATES USING ACOUSTIC ENERGY
App. No. 14/490,080
→
SYSTEMS AND METHODS FOR DRYING A ROTATING SUBSTRATE
App. No. 14/294,742
→
REDUCED CONSUMPTIONS STAND ALONE RINSE TOOL HAVING SELF-CONTAINED CLOSED-LOOP FLUID CIRCUIT, AND METHOD OF RINSING SUBSTRATES USING THE SAME
App. No. 14/239,709
→
COMPOSITE TRANSDUCER APPARATUS AND SYSTEM FOR PROCESSING A SUBSTRATE AND METHOD OF CONSTRUCTING THE SAME
App. No. 14/281,829
→
SYSTEM, APPARATUS AND METHOD FOR PROCESSING SUBSTRATES USING ACOUSTIC ENERGY
App. No. 14/171,190
→
METHOD FOR PROCESSING FLAT ARTICLES
App. No. 13/686,697
→
SYSTEMS AND METHODS FOR DRYING A ROTATING SUBSTRATE
App. No. 13/633,843
→
COMPOSITE TRANSDUCER APPARATUS AND SYSTEM FOR PROCESSING A SUBSTRATE AND METHOD OF CONSTRUCTING THE SAME
App. No. 13/633,662
→
SYSTEMS AND METHODS FOR DRYING A ROTATING SUBSTRATE
App. No. 13/296,760
→
METHOD FOR MEGASONIC PROCESSING OF AN ARTICLE
App. No. 13/270,849
→
APPARATUS FOR EJECTING FLUID ONTO A SUBSTRATE AND SYSTEM AND METHOD OF INCORPORATING THE SAME
App. No. 13/104,580
→
METHOD OF PRIMING AND DRYING SUBSTRATES
App. No. 13/092,661
→
SYSTEM AND METHOD FOR THE SONIC-ASSISTED CLEANING OF SUBSTRATES UTILIZING A SONIC-TREATED LIQUID
App. No. 12/445,783
→
METHOD OF MANUFACTURING A SOLAR CELL USING A PRE-CLEANING STEP THAT CONTRIBUTES TO HOMOGENEOUS TEXTURE MORPHOLOGY
App. No. 12/898,374
→
ACOUSTIC ENERGY SYSTEM, METHOD AND APPARATUS FOR PROCESSING FLAT ARTICLES
App. No. 12/871,286
→
METHOD FOR SELECTIVE UNDER-ETCHING OF POROUS SILICON
App. No. 12/716,785
→
SYSTEMS AND METHODS FOR DRYING A ROTATING SUBSTRATE
App. No. 12/685,935
→
COMPOSITE TRANSDUCER APPARATUS AND SYSTEM FOR PROCESSING A SUBSTRATE AND METHOD OF CONSTRUCTING THE SAME
App. No. 12/266,543
→
Method for cleaning substrates utilizing surface passivation and/or oxide layer growth to protect from pitting
App. No. 12/070,620
→
METHOD OF CLEANING SUBSTRATES UTILIZING MEGASONIC ENERGY
App. No. 11/873,750
→
SYSTEM AND METHOD FOR PROCESSING A SUBSTRATE UTILIZING A GAS STREAM FOR PARTICLE REMOVAL
App. No. 11/841,427
→
SYSTEM FOR MEGASONIC PROCESSING OF AN ARTICLE
App. No. 11/839,885
→
APPARATUS AND METHOD OF MEASURING ACOUSTICAL ENERGY APPLIED TO A SUBSTRATE
App. No. 11/837,292
→
APPARATUS FOR EJECTING FLUID ONTO A SUBSTRATE AND SYSTEM AND METHOD INCORPORATING THE SAME
App. No. 11/781,835
→
TRANSDUCER ASSEMBLY INCORPORATING A TRANSMITTER HAVING THROUGH HOLES, AND METHOD AND SYSTEM FOR CLEANING A SUBSTRATE UTILIZING THE SAME
App. No. 11/777,252
→
APPARATUS, SYSTEM AND METHOD FOR PROCESSING A SUBSTRATE THAT PROHIBITS AIR FLOW CONTAINING CONTAMINANTS AND/OR RESIDUES FROM DEPOSITING ON THE SUBSTRATE
App. No. 11/777,258
→
APPARATUS AND METHOD FOR PROCESSING A HYDROPHOBIC SURFACE OF A SUBSTRATE
App. No. 11/755,619
→
SPRAY JET CLEANING APPARATUS AND METHOD
App. No. 11/745,866
→
SYSTEM AND METHOD FOR SELECTIVE ETCHING OF SILICON NITRIDE DURING SUBSTRATE PROCESSING
App. No. 10/585,229
→
SYSTEM APPARATUS AND METHODS FOR PROCESSING SUBSTRATES USING ACOUSTIC ENERGY
App. No. 11/625,651
→
ACOUSTIC ENERGY SYSTEM, METHOD AND APPARATUS FOR PROCESSING FLAT ARTICLES
App. No. 11/625,556
→
SYSTEMS AND METHODS FOR DRYING A ROTATING SUBSTRATE
App. No. 11/624,445
→
Process sequence for photoresist stripping and cleaning of photomasks for integrated circuit manufacturing
App. No. 11/649,535
→
Reciprocating megasonic probe
App. No. 11/640,718
→
MEGASONIC CLEANING USING SUPERSATURATED SOLUTION
App. No. 11/595,029
→
System and method of cleaning substrates using a subambient process solution
App. No. 11/544,802
→
Megasonic cleaning system with buffered cavitation method
App. No. 11/489,059
→
System and method of processing substrates using sonic energy having cavitation control
App. No. 11/454,447
→
TRANSDUCER ASSEMBLY FOR MAGASONIC PROCESSING OF AN ARTICLE AND APPARATUS UTILIZING THE SAME
App. No. 11/375,907
→
Method and system for processing substrates with sonic energy that reduces or eliminates damage to semiconductor devices
App. No. 11/370,707
→
Method and system for processing substrates with sonic energy that reduces or eliminates damage to semiconductor devices
App. No. 11/370,361
→
APPARATUS AND METHOD FOR REMOVING TRACE AMOUNTS OF LIQUID FROM SUBSTRATES DURING SINGLE-SUBSTRATE PROCESSING
App. No. 11/266,402
→
System and method of powering a sonic energy source and use of the same to process substrates
App. No. 11/227,705
→
Reduced pressure irradiation processing method and apparatus
App. No. 11/178,923
→
Method and apparatus for creating ozonated process solutions having high ozone concentration
App. No. 11/177,147
→
System and method for pre-gate cleaning of substrates
App. No. 11/176,406
→
MEMBRANE DRYER
App. No. 10/951,009
→
Apparatus for carrying reticles and method of using the same to process reticles
App. No. 10/931,441
→
PROCESS SEQUENCE FOR PHOTORESIST STRIPPING AND/OR CLEANING OF PHOTOMASKS FOR INTEGRATED CIRCUIT MANUFACTURING
App. No. 10/909,764
→
SYSTEM AND METHOD FOR POINT-OF-USE FILTRATION AND PURIFICATION OF FLUIDS USED IN SUBSTRATE PROCESSING
App. No. 10/895,511
→
Megasonic cleaner and dryer
App. No. 10/865,440
→
MEGASONIC CLEANER AND DRYER
App. No. 10/864,927
→
MEGASONIC CLEANING USING SUPERSATURATED CLEANING SOLUTION
App. No. 10/864,929
→
APPARATUS AND METHODS FOR REDUCING DAMAGE TO SUBSTRATES DURING MEGASONIC CLEANING PROCESSES
App. No. 10/760,596
→
SONIC-ENERGY CLEANER SYSTEM WITH GASIFIED FLUID
App. No. 10/742,214
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SUBSTRATE PROCESS TANK WITH ACOUSTICAL SOURCE TRANSMISSION AND METHOD OF PROCESSING SUBSTRATES
App. No. 10/699,042
→
METHOD FOR REMOVAL OF PHOTORESIST USING SPARGER
App. No. 10/634,440
→
PROCESS AND APPARATUS FOR REMOVAL OF PHOTORESIST FROM SEMICONDUCTOR WAFERS USING SPRAY NOZZLES
App. No. 10/366,054
→
CAPILLARY DRYING OF SUBSTRATES
App. No. 10/358,636
→
MEGASONIC CLEANING SYSTEM WITH BUFFERED CAVITATION METHOD
App. No. 10/341,425
→
METHOD OF PROCESSING SUBSTRATES USING PRESSURIZED MIST GENERATION
App. No. 10/304,583
→
MEGASONIC CLEANER AND DRYER SYSTEM
App. No. 10/171,430
→
Megasonic cleaner and dryer system
App. No. 10/171,494
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Method of applying liquid to a megasonic apparatus for improved cleaning control
App. No. 10/171,431
→
STACKABLE PROCESS CHAMBERS
App. No. 10/171,429
→
MEGASONIC CLEANER AND DRYER
App. No. 10/171,426
→
RECIPROCATING MEGASONIC PROBE
App. No. 10/140,029
→
APPARATUS FOR TREATING SUBSTRATES
App. No. 10/031,923
→
NEXTGEN WET PROCESS TANK
App. No. 10/117,778
→
MEMBRANE DRYER
App. No. 10/117,739
→
CHEMICAL CONCENTRATION CONTROL DEVICE
App. No. 10/117,725
→
PROCESS TANK WITH PRESSURIZED MIST GENERATION
App. No. 10/117,768
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DRYING VAPOR GENERATION
App. No. 10/098,847
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CLEANING AND DRYING METHOD AND APPARATUS
App. No. 10/091,011
→
MEGASONIC PROBE ENERGY DIRECTOR
App. No. 10/059,682
→
METHOD AND SYSTEM FOR CHEMICAL INJECTION IN SILICON WAFER PROCESSING
App. No. 10/053,364
→
LOW PROFILE WAFER CARRIER
App. No. 10/053,449
→
SYSTEM FOR REMOVAL OF PHOTORESIST USING SPARGER
App. No. 10/052,823
→
PARTICLE BARRIER DRAIN
App. No. 10/014,121
→
MEGASONIC PROBE ENERGY ATTENUATOR
App. No. 09/922,509
→
MEGASONIC CLEANER PROBE SYSTEM WITH GASIFIED FLUID
App. No. 09/906,384
→