IP Library Assignment 045146/0552
Patent Assignment
Reel/Frame 045146/0552

Assignment of Assignor's Interest

Recorded: 2018-03-08 Pages: 2
Assignor
YAMAGUCHI, YOSHIHIDE
Executed: 2018-02-06
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property (1)
A Semiconductor Manufacturing Apparatus for Manufacturing a Semiconductor Device Having a High-K Insulating Film, and A Method for Manufacturing the Semiconductor Device
Application: 15/904,878 →
Publication: US 2018/0308707
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →