IP Library Assignment 045155/0229
Patent Assignment
Reel/Frame 045155/0229

Assignment of Assignor's Interest

Recorded: 2018-03-09 Pages: 2
Assignors
KAMAJI, YOSHITO
Executed: 2017-11-27
SUMIYA, MASAHIRO
Executed: 2017-11-27
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property (1)
Plasma Processing Apparatus and Prediction Method of the Condition of Plasma Processing Apparatus
Application: 15/904,917 →
Publication: US 2019/0088455
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Mar 25, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052225/0894 →