IP Library Assignment 045235/0171
Patent Assignment
Reel/Frame 045235/0171

Assignment of Assignor's Interest

Recorded: 2018-03-15 Pages: 3
Assignors
YAMADA, KAZUYA
Executed: 2017-11-29
YAMAMOTO, KOICHI
Executed: 2017-11-29
YASUI, NAOKI
Executed: 2017-11-29
IKEDA, NORIHIKO
Executed: 2017-11-29
MORI, ISAO
Executed: 2017-11-29
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property (1)
Plasma Processing Apparatus and Plasma Processing Method
Application: 15/919,682 →
Publication: US 2019/0088452
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Mar 25, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052225/0894 →