IP Library Assignment 045524/0209
Patent Assignment
Reel/Frame 045524/0209

Assignment of Assignor's Interest

Recorded: 2018-04-12 Pages: 3
Assignors
KOFUJI, NAOYUKI
Executed: 2012-07-17
YOKOGAWA, KEN'ETSU
Executed: 2012-07-19
NEGISHI, NOBUYUKI
Executed: 2012-07-17
KAMIBAYASHI, MASAMI
Executed: 2012-07-18
MIYAKE, MASATOSHI
Executed: 2012-07-17
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property (1)
Plasma Etching Method
Application: 15/951,814 →
Publication: US 2018/0233329
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →