Patent Assignment
Reel/Frame 045591/0037
Assignment of Assignor's Interest
Recorded: 2018-04-19
Pages: 6
Assignors
CHENG, CHUNG-LIANG
Executed: 2018-01-03
LIU, YU-LIN
Executed: 2018-03-31
LIN, MING-HSIEN
Executed: 2018-01-11
LUO, TZO-HUNG
Executed: 2018-01-11
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
8, LI-HSIN RD. 6, HSINCHU SCIENCE PARK, HSINCHU, 300-78, TAIWAN
Covered Property
(1)
Atomic Layer Deposition Based Process for Contact Barrier Layer
Patent:
10,170,322 →
Application:
15/815,059 →