Patent Assignment
Reel/Frame 045939/0795
Assignment of Assignor's Interest
Recorded: 2018-05-30
Pages: 3
Assignee
SILTRONIC AG
HANNS-SEIDEL-PLATZ 4, MUNICH, 81737, GERMANY
Covered Property
(1)
Method for Producing a Semiconductor Wafer with Epitaxial Layer in a Deposition Chamber, Apparatus for Producing a Semiconductor Wafer with Epitaxial Layer, and Semiconductor Wafer with Epitaxial Layer
Related Assignments
(2)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Address
Jun 30, 2021
From: SILTRONIC AG
To: SILTRONIC AG
Reel/Frame 056719/0881 →
Corrective Assignment to Correct the Date of the Change of Address from 03/12/2020 to 12/03/2020 Previously Recorded at Reel: 056719 Frame: 0881. Assignor(S) Hereby Confirms the Assignment.
Jul 1, 2021
From: SILTRONIC AG
To: SILTRONIC AG
Reel/Frame 057561/0451 →