Patent Assignment
Reel/Frame 046277/0951
Assignment of Assignor's Interest
Recorded: 2018-07-06
Pages: 2
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI-SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property
(1)
Gas Diffusion Plate for a Plasma Processing Apparatus
Patent:
868,995 →
Application:
29/638,441 →
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.