IP Library › Granted Patent US 868,995
Granted Patent S1
US 868,995 · App. 29/638,441 · Granted Dec 3, 2019

Gas diffusion plate for a plasma processing apparatus

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Quick Facts
Patent No.
US 868,995
App. No.
29/638,441
Granted
Dec 3, 2019
Kind
S1
Claims (1)

The ornamental design for a gas diffusion plate for a plasma processing apparatus, as shown and described.

Assignments (2)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 6, 2018
From: TANAKA, KAZUUMI; OKUDA, KOUJI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 046277/0951 →