IP Library Assignment 046509/0546
Patent Assignment
Reel/Frame 046509/0546

Assignment of Assignor's Interest

Recorded: 2018-07-31 Pages: 2
Assignors
OKUDA, KOUJI
Executed: 2018-06-25
TANAKA, MOTOHIRO
Executed: 2018-06-25
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI-SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Gas Ring for a Plasma Processing Apparatus
Patent: 871,608 →
Application: 29/635,289 →
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →