IP Library › Granted Patent US 871,608
Granted Patent S1
US 871,608 · App. 29/635,289 · Granted Dec 31, 2019

Gas ring for a plasma processing apparatus

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Quick Facts
Patent No.
US 871,608
App. No.
29/635,289
Granted
Dec 31, 2019
Kind
S1
Claims (1)

The ornamental design for a gas ring for a plasma processing apparatus, as shown and described.

Assignments (2)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 31, 2018
From: OKUDA, KOUJI; TANAKA, MOTOHIRO
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 046509/0546 →