IP Library Assignment 046575/0230
Patent Assignment
Reel/Frame 046575/0230

Assignment of Assignor's Interest

Recorded: 2018-08-07 Pages: 2
Assignors
KAO, WAN-YI
Executed: 2018-07-23
KO, CHUNG-CHI
Executed: 2018-07-23
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
8, LI-HSIN RD. 6, HSINCHU SCIENCE PARK, HSINCHU, 300-78, TAIWAN
Covered Property (1)
Forming Nitrogen-Containing Low-K Gate Spacer
Application: 16/057,308 →
Publication: US 2020/0006151