Patent Assignment
Reel/Frame 047252/0278
Assignment of Assignor's Interest
Recorded: 2018-10-22
Pages: 9
Assignors
CHEN, ZHIHONG
Executed: 2017-03-21
CHUGH, SUNNY
Executed: 2017-04-07
MEHTA, RUCHIT
Executed: 2017-04-13
Assignee
PURDUE RESEARCH FOUNDATION
1801 NEWMAN ROAD, WEST LAFAYETTE, INDIANA, 47906
Covered Properties
(2)
Plasma-Enhanced Chemical Vapor Deposition Methods for Graphene Deposition
Plasma-Enhanced Chemical Vapor Deposition Methods for Graphene Deposition
Application:
62/302,361 →