IP Library › Assignment 048544/0245
Patent Assignment
Reel/Frame 048544/0245

Assignment of Assignor's Interest

Recorded: 2019-03-08 Pages: 2
Assignor
HIRONAKA, YOSHIYUKI
Executed: 2018-12-14
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property (1)
Plasma Processing Apparatus and Plasma Processing Method
Application: 16/287,814 →
Publication: US 2019/0393021
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Mar 25, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052225/0894 →