IP Library Assignment 048547/0858
Patent Assignment
Reel/Frame 048547/0858

Assignment of Assignor's Interest

Recorded: 2019-03-08 Pages: 2
Assignors
MATSUI, MIYAKO
Executed: 2019-01-11
USUI, TATEHITO
Executed: 2019-01-15
IZAWA, MASARU
Executed: 2019-01-21
KUWAHARA, KENICHI
Executed: 2019-01-24
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property (1)
Plasma Processing Method and Plasma Processing Apparatus
Application: 16/328,228 →
Publication: US 2019/0237337
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Mar 25, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052225/0894 →