IP Library Assignment 048561/0271
Patent Assignment
Reel/Frame 048561/0271

Assignment of Assignor's Interest

Recorded: 2019-03-11 Pages: 5
Assignors
HANSEN, STEVEN GEORGE
Executed: 2016-09-30
LYAKHOVA, KATERYNA STANISLAVOVNA
Executed: 2016-10-10
VAN ADRICHEM, PAULUS JACOBUS MARIA
Executed: 2016-10-10
Assignee
ASML NETHERLANDS B.V.
PO BOX 324, VELDHOVEN, 5500 AH, NETHERLANDS
Covered Property (1)
Optimization of a Lithography Apparatus or Patterning Process Based on Selected Aberration
Application: 16/332,075 →
Publication: US 2019/0369480