IP Library Assignment 048582/0426
Patent Assignment
Reel/Frame 048582/0426

Assignment of Assignor's Interest

Recorded: 2019-03-13 Pages: 3
Assignors
HIMBELE, LUKE JOSEPH
Executed: 2019-01-07
SONODA, YASUSHI
Executed: 2019-01-21
UEMURA, TAKASHI
Executed: 2019-01-18
ICHIMARU, TOMOYOSHI
Executed: 2019-01-18
SASAKI, JUNYA
Executed: 2019-01-07
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property (1)
Plasma Processing Apparatus
Application: 16/216,455 →
Publication: US 2019/0189403
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Mar 25, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052225/0894 →