Patent Assignment
Reel/Frame 048652/0372
Assignment of Assignor's Interest
Recorded: 2019-03-20
Pages: 2
Assignor
TANAKA, KEIICHI
Executed: 2019-02-10
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property
(1)
Plasma Processing Method and Plasma Processing Apparatus
Application:
16/353,513 →
Publication:
US 2019/0287825
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.