IP Library Assignment 049208/0054
Patent Assignment
Reel/Frame 049208/0054

Assignment of Assignor's Interest

Recorded: 2019-05-17 Pages: 9
Assignors
NOSAKA, NAOYA
Executed: 2019-04-26
WAKAMATSU, GOJI
Executed: 2019-05-03
ABE, TSUBASA
Executed: 2019-05-14
MATSUMURA, YUUSHI
Executed: 2019-04-24
TAKIMOTO, YOSHIO
Executed: 2019-04-23
NAKAFUJI, SHIN-YA
Executed: 2019-05-14
SAKAI, KAZUNORI
Executed: 2019-04-26
Assignee
JSR CORPORATION
9-2, HIGASHI-SHINBASHI 1-CHOME,, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Composition for Resist Underlayer Film Formation, Resist Underlayer Film and Forming Method Thereof, Production Method of Patterned Substrate, and Compound
Application: 16/388,238 →
Publication: US 2019/0243247
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Merger Mar 23, 2026
From: JSR CORPORATION
To: JICC-02, CO., LTD
Reel/Frame 075191/0149 →
Change of Name Mar 23, 2026
From: JICC-02 CO., LTD
To: JSR CORPORATION
Reel/Frame 075192/0023 →