IP Library Assignment 049564/0914
Patent Assignment
Reel/Frame 049564/0914

Assignment of Assignor's Interest

Recorded: 2019-06-24 Pages: 2
Assignors
MIURA, MAKOTO
Executed: 2019-05-29
ISHII, YOHEI
Executed: 2019-05-28
SAKAI, SATOSHI
Executed: 2019-05-28
MAEDA, KENJI
Executed: 2019-05-28
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property (1)
Manufacturing Method of a Semiconductor Device and a Plasma Processing Apparatus
Application: 16/371,502 →
Publication: US 2020/0312658
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Mar 25, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052225/0894 →