Patent Assignment
Reel/Frame 049613/0120
Assignment of Assignor's Interest
Recorded: 2019-06-27
Pages: 3
Assignors
KHADERBAD, MRUNAL A.
Executed: 2019-06-11
TSAI, PANG-YEN
Executed: 2019-06-11
OKUNO, YASUTOSHI
Executed: 2019-06-12
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
8, LI-HSIN RD. 6, HSINCHU SCIENCE PARK, HSINCHU, 300-78, TAIWAN
Covered Property
(1)
Selective Dual Silicide Formation Using a Maskless Fabrication Process Flow