IP Library Assignment 050430/0561
Patent Assignment
Reel/Frame 050430/0561

Assignment of Assignor's Interest

Recorded: 2019-09-19 Pages: 5
Assignors
FUJISAKI, SUMIKO
Executed: 2019-09-03
YAMAGUCHI, YOSHIHIDE
Executed: 2019-09-09
KOBAYASHI, HIROYUKI
Executed: 2019-09-03
SHINODA, KAZUNORI
Executed: 2019-09-04
KAWAMURA, KOHEI
Executed: 2019-09-04
KOUZUMA, YUTAKA
Executed: 2019-09-06
IZAWA, MASARU
Executed: 2019-09-05
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI-SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property (1)
Plasma Etching Method and Plasma Processing Apparatus
Application: 16/495,515 →
Publication: US 2021/0358760
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Mar 25, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052225/0894 →