Patent Assignment
Reel/Frame 050432/0434
Assignment of Assignor's Interest
Recorded: 2019-09-19
Pages: 7
Assignors
KOBAYASHI, HIROYUKI
Executed: 2019-08-21
MIYOSHI, NOBUYA
Executed: 2019-08-09
SHINODA, KAZUNORI
Executed: 2019-08-09
KOUZUMA, YUTAKA
Executed: 2019-08-29
IZAWA, MASARU
Executed: 2019-08-27
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI-SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property
(1)
Substrate Processing Method and Plasma Processing Apparatus
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.