IP Library › Assignment 050992/0608
Patent Assignment
Reel/Frame 050992/0608

Assignment of Assignor's Interest

Recorded: 2019-11-13 Pages: 3
Assignors
CHIANG, KUO-CHENG
Executed: 2019-09-08
TSAI, CHING-WEI
Executed: 2019-09-10
LIU, CHI-WEN
Executed: 2019-09-18
LEUNG, YING-KEUNG
Executed: 2019-09-17
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
8, LI-HSIN RD. 6, HSINCHU SCIENCE PARK, HSINCHU, 300-78, TAIWAN
Covered Properties (4)
Devices Including Gate Spacer with Gap or Void and Methods of Forming the Same
Patent: 9,559,184 →
Application: 14/739,977 →
Publication: US 2016/0365426
Devices Including Gate Spacer with Gap or Void and Methods of Forming the Same
Patent: 9,917,178 →
Application: 15/419,289 →
Publication: US 2017/0141215
Devices Including Gate Spacer with Gap or Void and Methods of Forming the Same
Application: 15/905,177 →
Publication: US 2018/0190796
Devices Including Gate Spacer with Gap or Void and Methods of Forming the Same
Application: 16/231,070 →
Publication: US 2019/0148526
Related Assignments (1)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Aug 25, 2015
From: CHING, KUO-CHENG; TSAI, CHING-WEI; LIU, CHI-WEN; LEUNG, YING-KEUNG
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Reel/Frame 036416/0732 →