IP Library Assignment 051004/0590
Patent Assignment
Reel/Frame 051004/0590

Assignment of Assignor's Interest

Recorded: 2019-11-14 Pages: 2
Assignor
WATANABE, TAKU
Executed: 2019-11-06
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI-SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Grounded Electrode for a Plasma Processing Apparatus
Patent: 916,038 →
Application: 29/706,143 →
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Apr 14, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052398/0249 →