IP Library Assignment 051152/0381
Patent Assignment
Reel/Frame 051152/0381

Assignment of Assignor's Interest

Recorded: 2019-12-02 Pages: 4
Assignors
UMETA, YOSHIKAZU
Executed: 2019-11-26
ATSUMI, HIRONORI
Executed: 2019-11-26
Assignee
SHOWA DENKO K.K.
13-9, SHIBADAIMON 1-CHOME, MINATO-KU, TOKYO, 105-8518, JAPAN
Covered Property (1)
SiC CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD OF MANUFACTURING SiC EPITAXIAL WAFER
Application: 16/699,360 →
Publication: US 2020/0173023
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Jun 23, 2023
From: SHOWA DENKO K.K.
To: RESONAC CORPORATION
Reel/Frame 064082/0513 →
Change of Address Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →