Patent Assignment
Reel/Frame 051851/0207
Assignment of Assignor's Interest
Recorded: 2019-11-19
Pages: 5
Assignors
KOH, SHAO-MING
Executed: 2017-08-21
LEE, CHEN-MING
Executed: 2017-08-21
WU, I-WEN
Executed: 2017-08-22
YANG, FU-KAI
Executed: 2017-08-21
WANG, JIA-HENG
Executed: 2017-08-21
WANG, MEI-YUN
Executed: 2017-08-21
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
8, LI-HSIN RD. 6, HSINCHU SCIENCE PARK, HSINCHU, 300-78, TAIWAN
Covered Property
(1)
Method for Source/Drain Contact Formation in Semiconductor Devices using Common Doping and Common Etching to N-Type and P-Type Source/Drains