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Patent Assignment
Reel/Frame 051953/0204

Assignment of Assignor's Interest

Recorded: 2020-02-27 Pages: 2
Assignor
SONODA, YASUSHI
Executed: 2020-02-03
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI-SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property (1)
Plasma Processing Apparatus and Plasma Processing Method
Application: 16/642,636 →
Publication: US 2020/0402809
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Nov 18, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 054401/0808 →