Patent Assignment
Reel/Frame 054401/0808
Assignment of Assignor's Interest
Recorded: 2020-11-18
Pages: 5
Assignor
HITACHI HIGH-TECHNOLOGIES CORPORATION
Executed: 2020-02-14
Assignee
HITACHI HIGH-TECH CORPORATION
17-1, TORANOMON 1-CHOME, MINATO-KU, TOKYO, 105-6409, JAPAN
Covered Properties
(6)
Plasma Processing Method and Plasma Processing Apparatus
Application:
16/642,187 →
Publication:
US 2020/0273683
Plasma Processing Method
Plasma Processing Apparatus and Plasma Processing Method
Automatic Analyzing Apparatus, and Method for Detecting Flow Path Clogging of the Automatic Analyzing Apparatus
Etching Apparatus and Etching Method and Detecting Apparatus of Film Thickness
Plasma Processing Apparatus and Inner Component of Plasma Processing Apparatus and Manufacturing Method of Inner Component of Plasma Processing Apparatus
Application:
16/646,917 →
Publication:
US 2021/0241998
Related Assignments
(6)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Feb 26, 2020
From: TAKAGI, YUTA; HIROTA, KOSA; INOUE, YOSHIHARU; MIYAJI, MASAKAZU
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 051938/0685 →
Assignment of Assignor's Interest
Feb 27, 2020
From: TAKAMATSU, TOMOHIRO; ARASE, TAKAO; KAJIFUSA, HIROYUKI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 051945/0899 →
Assignment of Assignor's Interest
Feb 27, 2020
From: SONODA, YASUSHI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 051953/0204 →
Assignment of Assignor's Interest
Mar 11, 2020
From: FUKUSHI, YUDAI; MORI, TAKAMICHI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 052086/0518 →
Assignment of Assignor's Interest
Mar 12, 2020
From: ETO, SOICHIRO; MINEMURA, HIROYUKI; USUI, TATEHITO
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 052098/0973 →
Assignment of Assignor's Interest
Mar 13, 2020
From: TAMURA, TOMOYUKI; IKENAGA, KAZUYUKI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 052104/0263 →