Patent Assignment
Reel/Frame 052104/0263
Assignment of Assignor's Interest
Recorded: 2020-03-13
Pages: 2
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI-SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property
(1)
Plasma Processing Apparatus and Inner Component of Plasma Processing Apparatus and Manufacturing Method of Inner Component of Plasma Processing Apparatus
Application:
16/646,917 →
Publication:
US 2021/0241998
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.