IP Library › Assignment 051978/0509
Patent Assignment
Reel/Frame 051978/0509

Assignment of Assignor's Interest

Recorded: 2020-02-20 Pages: 2
Assignors
IKEDA, NORIHIKO
Executed: 2020-01-29
YASUI, NAOKI
Executed: 2020-01-29
YAMADA, KAZUYA
Executed: 2020-01-29
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI-SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property (1)
Plasma Processing Apparatus, Plasma Processing Method, and Ecr Height Monitor
Application: 16/640,443 →
Publication: US 2020/0286715
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Mar 25, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052225/0894 →