Patent Assignment
Reel/Frame 052490/0803
Assignment of Assignor's Interest
Recorded: 2020-04-24
Pages: 3
Assignors
SHIBAYAMA, WATARU
Executed: 2020-03-11
HATTORI, HAYATO
Executed: 2020-03-11
ISHIBASHI, KEN
Executed: 2020-03-09
NAKAJIMA, MAKOTO
Executed: 2020-03-11
Assignee
NISSAN CHEMICAL CORPORATION
5-1, NIHONBASHI 2-CHOME, CHUO-KU, TOKYO, 1036119, JAPAN
Covered Property
(1)
Semiconductor Device Production Method Employing Silicon-Containing Resist Underlayer Film-Forming Composition Including Organic Group Having Ammonium Group