Patent Assignment
Reel/Frame 052727/0015
Assignment of Assignor's Interest
Recorded: 2020-05-21
Pages: 3
Assignee
KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
5, HWARANG-RO 14-GIL, SEONGBUK-GU, SEOUL, 02792, KOREA, REPUBLIC OF
Covered Property
(1)
A Masking Block That Is Configured in a Pattern for Direct Synthesis of a Two-Dimensional Material Having the Pattern on a Growth Substrate and That Is Easily Bondable to and Debondable from the Growth Substrate