IP Library › Assignment 052966/0200
Patent Assignment
Reel/Frame 052966/0200

Assignment of Assignor's Interest

Recorded: 2020-06-17 Pages: 5
Assignor
CLEANLOGIX LLC
Executed: 2020-05-19
Assignee
HITACHI HIGH-TECH CORPORATION
1-17-1 TORANOMON, MINATO-KU, TORANOMON HILLS BUSINESS TOWER, TOKYO, 105-6409, JAPAN
Covered Properties (22)
Passive Electrostatic CO2 Composite Spray Applicator
Adaptive R744 Minimum Quantity Cooling Lubrication System
Dense Fluid Spray Cleaning Method and Apparatus
Patent: 5,725,154 →
Application: 08/516,530 →
Method and Apparatus for Creating an Open Cell Micro-Environment for Treating a Substrate with an Impingement Spray
Patent: 6,656,017 →
Application: 10/132,095 →
Publication: US 2002/0155792
Dense Fluid Spray Cleaning Process and Apparatus
Patent: 7,451,941 →
Application: 10/221,593 →
Publication: US 2003/0207655
Dense Fluid Cleaning Centrifugal Phase Shifting Separation Process and Apparatus
Patent: 6,802,961 →
Application: 10/221,767 →
Publication: US 2003/0205510
Method and Apparatus for Supercritical Ozone Treatment of a Substrate
Patent: 7,219,677 →
Application: 10/343,734 →
Apparatus Process and Method for Mounting and Treating a Substrate
Patent: 7,225,819 →
Application: 10/433,833 →
Publication: US 2005/0098195
Apparatus and Process for the Treatment, Delivery and Recycle of Process Fluids Used in Dense Phase Carbon Dioxide Applications
Patent: 6,979,362 →
Application: 10/476,108 →
Publication: US 2004/0131516
Dense Fluid Cleaning Centrifugal Phase Shifting Separation Process and Apparatus
Patent: 7,601,112 →
Application: 11/271,725 →
Publication: US 2007/0259766
Dense Fluid Delivery Apparatus
Patent: 7,901,540 →
Application: 11/465,762 →
Publication: US 2006/0279222
Method and Apparatus for Treating a Substrate with Dense Fluid and Plasma
Patent: 8,197,603 →
Application: 11/465,775 →
Publication: US 2006/0278254
Substrate Treatment Process
Patent: 8,021,489 →
Application: 13/016,836 →
Publication: US 2011/0132395
Method for forming and applying an oxgenated machining fluid
Application: 13/733,880 →
Particle-Plasma Ablation Process
Patent: 9,352,355 →
Application: 13/863,311 →
Particle-Plasma Ablation Process for Polymeric Ophthalmic Substrate Surface
Patent: 9,387,511 →
Application: 13/863,318 →
CO2 Composite Spray Method and Apparatus
Patent: 9,221,067 →
Application: 14/307,488 →
Publication: US 2014/0367479
Determination of Composition and Structure of a CO2 Composite Spray
Patent: 9,227,215 →
Application: 14/308,697 →
Publication: US 2014/0367483
Method and Apparatus for Cutting and Cleaning a Superhard Substrate
Patent: 9,381,574 →
Application: 14/335,875 →
Passive Electrostatic CO2 Composite Spray Applicator
Application: 15/945,698 →
Publication: US 2018/0280998
Adaptive R744 Minimum Quantity Cooling Lubrication System
Application: 16/217,040 →
Publication: US 2019/0176285
Adaptive R744 Minimum Quantity Cooling Lubrication System
Application: 62/597,526 →
Related Assignments (5)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Jan 13, 2016
From: JACKSON, DAVID; MARIAN, LIVIU; SOTO, FELIPE; LEE, JOHN
To: CLEANLOGIX LLC
Reel/Frame 037475/0720 →
Assignment of Assignor's Interest Aug 3, 2018
From: JACKSON, DAVID P; JACKSON, MACKENZIE A
To: CLEANLOGIX LLC
Reel/Frame 046555/0133 →
Assignment of Assignor's Interest Dec 11, 2018
From: JACKSON, DAVID P.; JACKSON, MACKENZIE A.; LEE, JOHN
To: CLEANLOGIX LLC
Reel/Frame 047748/0907 →
Assignment of Assignor's Interest Nov 27, 2019
From: JACKSON, DAVID PETER, MR.
To: CLEANLOGIX LLC
Reel/Frame 051125/0935 →
Assignment of Assignor's Interest Dec 23, 2019
From: JACKSON, DAVID P
To: CLEANLOGIX LLC
Reel/Frame 051357/0723 →