IP Library › Assignment 053160/0915
Patent Assignment
Reel/Frame 053160/0915

Assignment of Assignor's Interest

Recorded: 2020-07-09 Pages: 3
Assignors
SHIH, CHIH-TSUNG
Executed: 2020-05-04
WU, YU-HSUN
Executed: 2020-05-12
LIU, BO-TSUN
Executed: 2020-06-25
LEE, TSUNG-CHUAN
Executed: 2020-06-19
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
NO.8, LI-HSIN RD.6, SCIENCE-BASED INDUSTRIAL PARK, HSINCHU, 300, TAIWAN
Covered Property (1)
Extreme Ultraviolet Lithography Method, Extreme Ultraviolet Mask and Formation Method Thereof
Application: 16/900,384 →
Publication: US 2021/0389661